This call is open to all Chinese artists including Taiwan, Hong Kong and Chinese nationals living / working overseas.
RESIDENCY: ONE RESIDENCY BETWEEN MID-NOVEMBER 2013 AND MID-FEBRUARY 2014 FOR A PERIOD OF 4 – 6 WEEKS, HOSTED AT EYEBEAM IN NEW YORK
APPLICATION DEADLINE: SEPTEMBER 15, 2013
With the generous support of Carroll / Fletcher Gallery, a London based contemporary art gallery, TASML is pleased to announce its new artist residence award: TASML | Carroll Fletcher Chinese Artist Residence Award. The award will provide emerging Chinese media artists with an unique opportunity to engage with cutting edge research and production at the intersection of art, science and technology in some of the most innovative media art and design laboratories around the world. From March 2013 until February 2015, two artists will be selected annually through an international open-call for proposal submissions.
In collaboration with Eyebeam the award allows one selected artist to work from 4 – 6 weeks with one of the most innovative art and technology centers operating today: Eyebeam. The awardee will receive a stipend to cover production, travel, accommodation and living expenses in New York.
Applications must be submitted in Chinese and English, and the applicant must have sufficient knowledge of English language for communication
We are asking what are the ground-breaking works that will positively change cultural relationships to new creative technologies? What does technology even mean in 2013 and how can it be creatively used and misused in a way that pushes boundaries and explodes notions of what is possible? If you are actively solving questions like these and could use TASML and Eyebeam’s help in realizing your work, let us know by applying online now!
This residency in collaboration with and hosted at Eyebeam is looking to support atypical new work that is deeply examining and critically challenging culture’s relationship to technology and will consider all proposals that are prepared to positively shift the dialogue. TASML will grant a minimum of $4,000 to each selected residency project but will consider requests for additional project-based funding up to an additional $2,000 maximum. The resident artist will be determined by the quality of applications.
Applications are selected based on:
· Quality of concept
· Quality of past work
· Innovative nature of the project
Send application (CV, project proposal) to firstname.lastname@example.org before September 15, 2013
540 W 21st St.
New York, New York 10011
United States of America